The electron beam ion trap(EBIT) and the electron ion source(EBIS) are new instruments for the study of X-ray produced by very highly-charged ions when they interact with free electrons.
利用电子束离子源（EBIS）或者电子束离子陷阱（EBIT）产生的慢速高电荷态重离子束轰击金属靶面，离子束与靶面作用并复合辐射特征X射线；
The drift tube assembly provides the axial trap for ions in an electron beam ion trap (EBIT).
漂移管组件为EBIT提供约束离子的轴向电势阱，是EBIT装置的核心区域。
The gas injection system for Shanghai electron beam ion trap (EBIT) facility is successfully developed.
本文介绍了上海电子束离子阱(EBIT)装置微量气体注入系统的成功研制。
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