The electron beam lithography and its improvement are introduced also.

同时还介绍了电子束光刻技术及其改进。

youdao

The proximity effect in the E-beam lithography system was verified by experiments.

利用电子束曝光机完成有关邻近效应的实验。

youdao

Electron - beam lithography with a novel multilevel resist structure defines the pattern.

采用新型的多层抗蚀剂结构的电子束光刻来形成图形。

youdao

If this (topdown) manufacturing process is to be based on the most modern forms of deposition (including epitaxy), e-beam or ultra-deep UV lithography and precision etching, the mainstay of microelectronics and optoelectronics fabrication, then there are strict limits described below for which one-off fabrication is possible, but manufacture is not.

FORBES: Are There Physical Limits to Nanotechnology?