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beam lithography

网络释义

  射束刻蚀法

... optical stepper lithography 步进式曝光蚀刻 beam lithography 射束刻蚀法 beamwriter lithography 电子束光刻 ...

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  电子束曝光

电子束曝光

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短语

electron beam lithography 电子束曝光 ; 电子束蚀刻 ; 电子束石版印刷术 ; 电子束微影

ion beam lithography 离子束刻蚀法 ; 离子束微影术 ; [电子] 离子束光刻 ; 离子束刻蚀

e-beam lithography 电子束微影 ; 电子束光刻 ; 电子束曝光系统 ; 电子束微影技术

scanning electron beam lithography 扫描式电子束刻蚀

write electron beam lithography 扫描式电子束光刻

vector scan electron beam lithography 矢量扫描电子束光刻

focused ion beam lithography 聚焦离子束光刻

direct write electron beam lithography 直写式电子束光刻

raster scan electron beam lithography 光栅扫描电子束光刻

 更多收起网络短语

有道翻译

beam lithography

电子束光刻技术

以上为机器翻译结果，长、整句建议使用 人工翻译 。

双语例句权威例句

  • The electron beam lithography and its improvement are introduced also.

    同时还介绍了电子束光刻技术及其改进。

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  • The proximity effect in the E-beam lithography system was verified by experiments.

    利用电子束曝光机完成有关邻近效应的实验。

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  • Electron - beam lithography with a novel multilevel resist structure defines the pattern.

    采用新型的多层抗蚀剂结构的电子束光刻来形成图形。

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更多双语例句

  • If this (topdown) manufacturing process is to be based on the most modern forms of deposition (including epitaxy), e-beam or ultra-deep UV lithography and precision etching, the mainstay of microelectronics and optoelectronics fabrication, then there are strict limits described below for which one-off fabrication is possible, but manufacture is not.

    FORBES: Are There Physical Limits to Nanotechnology?

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