The apparatus USES a resistively heated filament array for dissociating hydrogen in the reactant gas.
该设备采用电阻式加热的灯丝组离解反应物气体中的氢。
To further increase deposition rates, the filament array is biased negatively with respect to the substrate holder so that a DC plasma is also maintained between the substrate and filament array.
为进一步提高沉积速度，对灯丝组施加相对于基底夹持器的负偏压，使得在基底和灯丝组之间的DC等离子体也得以保持。
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