The cathode electric arc source is used as the source of ion infiltrating metals.
本文用阴极电弧源做离子渗金属源。
Often used standard light source is synchrotron radiation source and wall stabilized argon arc source.
常用的光源标准如同步辐射光源和壁稳亚弧光源等。
It was found that the substrate floating potential changes a lot when the grounded state of arc source changed.
在实验过程中还发现弧源不同的接地方式对基片台悬浮电位有很大的影响。
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