Boron deficiency stress mainly acted on aerial part of watermelon,especially for apical growing point. High boron stress firstly acted on under-ground part and bottom leaves,gradually acted on aerial part of watermelon.3.
缺硼胁迫主要作用于西瓜地上部,尤其是顶端生长点;高硼胁迫首先作用于西瓜的地下部和底部叶片,并逐步向上发展。
参考来源 - 不同基因型西瓜（Citrullus lanatus）硼素营养生理的研究·2,447,543篇论文数据，部分数据来源于NoteExpress
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