Two-layer low refractive nanometer antireflection coating was prepared in the conductive glass of solar cells with the sol-gel czochralski method.
利用溶胶-凝胶提拉法在太阳能电池用的导电玻璃上制备出双层低折射率纳米减反射膜,研究了该反射膜的结构、减反射性能、光学参数以及对电池效率的影响。
参考来源 - 太阳电池用低折射率纳米晶减反射膜研究Design and fabrication of the broadband infrared antireflection coating on PbMoO4 single crystal in vacuum are explored theoretically and experimentally.
本文从理论和实验两个方面讨论了钼酸铅晶体表面的宽带红外增透膜的设计以及其在真空环境中的制备。
参考来源 - 钼酸铅晶体表面镀制光学薄膜的工艺研究1064 nm,532 nm frequency-doubled antireflection coating with out buffer layer or with different buffer layers were fabricated by using electron beam evaporation technique on LBO.
采用电子束蒸发方法在LiB3O5(LBO)晶体上制备了无缓冲层和具有不同缓冲层的1064nm,532nm倍频增透膜。
参考来源 - 缓冲层对LiB·2,447,543篇论文数据，部分数据来源于NoteExpress
Antireflection coating, particularly for solar cells, and method for producing this coating.
抗反射涂层，尤其用于太阳能电池，以及用于生产该涂层的方法。
Double-layer transparent films, silicon nitride and silicon dioxide can be used as antireflection coating on silicon PIN photodetector.
氮化硅、二氧化硅双层透明膜可用作硅PIN光电探测器抗反射膜。
Design and fabrication of the broadband infrared antireflection coating on PbMoO4 single crystal in vacuum are explored theoretically and experimentally.
本文从理论和实验两个方面讨论了钼酸铅晶体表面的宽带红外增透膜的设计以及其在真空环境中的制备。
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