There are lots of particles adsorbed on wafer surface after CMP. Preference adsorption model was established according to the adsorption state.
CMP后大量颗粒吸附在芯片表面，根据颗粒在芯片表面的吸附状态，确立优先吸附模型。
Meanwhile, the 2h-w (100) surface system was studied by the extended LEPS method for investigating the subsurface adsorption state effect on the surface adsorption state.
同时，为了研究内层吸附态对表层吸附态性质的影响，利用改进推广的LEPS方法研究了2 H - W(100)表面体系。
Owing to their giant specific area, the porous media are of a relatively strong adsorption capacity and the fluid exists as two states, i. e. adsorption state and free state.
多孔介质由于其巨大的比面积而具有较强的吸附能力， 流体因而以吸附态和自由态两种状态存在。
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