surface adsorption state 表面吸附态
chemical adsorption state 化学吸附态
coexisting adsorption state 并存吸附状态
adsorption unsteady-state 吸附动态
precursor state adsorption 亚稳分子吸附态
There are lots of particles adsorbed on wafer surface after CMP. Preference adsorption model was established according to the adsorption state.
CMP后大量颗粒吸附在芯片表面，根据颗粒在芯片表面的吸附状态，确立优先吸附模型。
Meanwhile, the 2h-w (100) surface system was studied by the extended LEPS method for investigating the subsurface adsorption state effect on the surface adsorption state.
同时，为了研究内层吸附态对表层吸附态性质的影响，利用改进推广的LEPS方法研究了2 H - W(100)表面体系。
Owing to their giant specific area, the porous media are of a relatively strong adsorption capacity and the fluid exists as two states, i. e. adsorption state and free state.
多孔介质由于其巨大的比面积而具有较强的吸附能力， 流体因而以吸附态和自由态两种状态存在。
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