等离子体源离子注入装置由脉冲负高压源系统、热阴极弧放电系统、真空室及样品台、真空系统和监测系统等五部分组成。
The plasma source ion implantation device consists of pulsed negative high voltage power, hot cathode arc discharge system, vacuum chamber and target stage, vacuum system and monitor system.
研制了一套高压脉冲电源和介质阻挡放电反应器，通过在常压下放电产生低温等离子体。
A high pulsed power supply and a dielectric barrier discharge reactor are designed, which produce non thermal plasma under normal atmospheric pressure.
分析了无声放电法、高压脉冲直流放电法和接触辉光放电法低温等离子体直接处理废水技术的特点。
The characters of waste water treatments using dielectric barrier discharge, pulsed high direct voltage discharge and contact glow-discharge cold plasma are analyzed.
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