光刻过程中由于光的衍射效应产生的非线性畸变对光刻面形质量具有严重影响，是造成光刻微结构图形失真的主要原因之一。
Nonlinear distortion caused by diffraction in the lithography process has severely affected the quality of surface profile, which is the main reason for pattern distortion in lithography.
理论分析表明，该现象可以用光克尔效应和热光非线性效应共同作用下的附加相位孔对入射光束的衍射行为来解释。
This phenomenon can be explained by the diffraction effect of the Gaussian beam from the laser induced phase hole in the nonlinear medium caused by Kerr effect and thermo optic effect.
相对论自聚焦的基本方程包括非线性源项和衍射的影响。
The basic equations for relativistic self-focusing include the nonlinear source term and the effect of diffraction.
应用推荐