采用多弧离子镀制备的合金涂层成分与合金阴极靶之间通常存在一定程度的偏差。
The composition generally changes from alloy cathode target to alloy coating deposited by multi arc ion plating to some extent.
分析了在外加磁场作用下，真空电弧镀膜中阴极靶面液池的受力情况，导出了液滴喷溅特性受磁场影响的关系式。
The forces applied on the molten pool at the cathode surface under the action of an external magnetic field during vacuum arc coating are analyzed.
首先提出真空管道自体真空镀膜新概念，采用特殊的阴极靶结构设计成功的解决了长管道内表面直流溅射镀膜的难题。
The new concept of the vacuum pipe sputter self-coating is introduced first, and special cathode target structure is introduced to get favorable coating.
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