镀膜方法有物理蒸镀法 physical vapor deposition ; PVD
本发明涉及电压锅的内锅以及内锅镀膜方法。
The invention relates to an inner pot of a voltage pot and a method for coating film on the inner pot.
研究结果表明，这种镀膜方法，可以镀各种金属和合金膜；
The results have shown: This coating process can deposit various metal and alloy film.
溅射镀膜方法是制备ito透明导电膜最常用也是实验研究最多的方法。
High quality ITO transparent conductive film was prepared by reactive low voltage ion plating technique, which is different to the most common sputtering method to deposit ITO film.
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