结合磁场诱导与选择性化学沉积，在微米级间隙金电极界面上原位生长镍纳米线。
A novel method to fabricate magnetic nickel nanostructures onto the interface of gold electrode pairs is presented by magnetic field-assisted selective chemical deposition of nickel.
该试剂进料流包括共沉积试剂与选择性硅去除试剂的混合物。
The reagent feed stream comprises a mixture of codeposition reagents and a selective silicon removal reagent.
使用RF功率调变控制该共沉积作用及该选择性硅去除步骤，后者步骤总是在关闭该R F功率或是将其降至低水准时进行。
RF power modulation is used to control the codeposition and the selective silicon removal steps with the later proceeds whenever the RF power is turned off or reduced to a low level.
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