双面抛光已成为硅晶片的主要后续加工方法，但由于需要严格的加工条件，很难获得理想的超光滑表面。
Double sided polishing process has become a main machining method for silicon wafer finishing process, but it is difficult to get ultra-smooth surface with the very stringent machining conditions.
结果表明，这种抛光工艺能获得原子级的超光滑表面。
Results show that this process can reach surface roughness with angstrom dimension.
针对激光陀螺反射镜常用材料微晶玻璃的加工技术，介绍了一种较为成熟的超光滑表面加工方法—定偏心浸液式抛光。
Nano-particle colloid jet polishing is a new kind of ultra-precision machining technology which has important research and application value in fabricating ultra smooth surface.
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