用二次离子质谱测量了注入硼离子的深度分布。
Secondary ion mass spectrometry was used to measure the distribution of implanted depths of boron ions.
本文介绍了KT—5托卡马克装置质谱测量的初步结果。
A primary measurement of mass spectrum on Tokamak KT-5 is presented.
在质谱测量中，低丰度236u同位素容易受到周围强峰拖尾的干扰。
The low abundance isotope 236u is easily disturbed by strong peak tails in the measurement of Mass Spectrometry.
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