共蒸发方法在体外进行。
Ta2O5薄膜采用传统的电子束蒸发方法沉积在BK7基底上。
Ta2O5 films are prepared on BK7 substrates with conventional electron beam evaporation deposition.
用热舟蒸发方法在不同的沉积速率下制备了LaF3单层膜，并对部分单层膜进行了真空退火。
LaF3 single-layer coatings were prepared by thermal boat evaporation at different deposition rates. Some of these films were annealed in vacuum.
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