Controlling the plasma density and the ion energy independently can modulate etch rates, etching selectivity and other processing parameters indirectly.
在刻蚀工艺中,反应腔室内的等离子体密度和轰击到电极上的离子能量起着极其重要的作用,因为等离子体密度直接影响刻蚀速率,离子能量则影响刻蚀的选择性及对产品的损伤,实现对等离子体密度和离子能量的独立控制可以间接的调制刻蚀率、选择性等工艺参数。
参考来源 - 双频容性耦合等离子体鞘层特性的流体力学模拟·2,447,543篇论文数据,部分数据来源于NoteExpress
分析了等离子体浓度对离子能量通量的影响。
The effect of plasma density on the ion energy flux is analyzed.
由此可见,磁镜场参数对离子能量分布有很大影响。
So the magnetic mirror parameters have significant effect on the ion energy distributions.
离子能量自动分析器由多极型探头和计算机控制的测量系统组成。
The analyzer was composed of a multi plate probe and a computer controlled measurement system.
So, if we have energy that's released, would you say that the chlorine ion is more or less stable than the chlorine atom?
那么,如果我们放出了能量,你认为氯离子比氯原子,更稳定还是更不稳定呢?
The z effective is lower, so we have to put less energy in to get an ion out.
它的有效核电量更低,所以我们只需要更少的能量就能打出一个离子。
And what I am going to do is say start with this ion, add up the energy associated with the interactions between that ion and everybody else in the row and then multiply it by Avogadro's number, because that is the number of atoms there are in a row.
接下来我要从这一离子开始,加上相互作用的能量,也就是这一离子,和其它所有在这一行的离子之间的能量,再乘以阿伏加德罗常数,因为这是在一行的原子的数量。
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