最后阐明我国研究和开发聚焦离子束装置及其应用技术的必要性。
At last the necessity has been stated to research and develop the equipments of focused ion beams and the technologies of their application.
对聚焦离子束曝光技术作了介绍。
In this paper, Focused Ion Beam Lithography technology and is introduced.
概述了聚焦离子束直接写入、离子研磨、离子注入及离子沉积技术。
An overview of the FIB direct write technique, applications in milling, implantation, and deposition is given.
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