流经硒层的X射线光子产生电子空穴对。
X-ray photons flowing through the selenium layer create electron hole pairs.
当光子以充足的能量轰击硅就产生了电子空穴对。
When photons with sufficient energy strike the silicon they create pairs of electrons and holes.
提出了腐蚀机理，光照激发位错处产生电子空穴对，加速位错处的腐蚀速率。
It is also demonstrated that the light source induces electron-hole pairs and enhances the etching rate at the dislocation sites.
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