将付里叶变换法运用于电子束曝光的邻近效应校正中，形成了快速、准确的剂量校正法。
By Fourier transform, produces a fast and accurate calculation for dose precompensation in proximity effect correction for electron beam lithography.
在读操作时，则是检测电子束在有电荷区或无电荷区的效应。
In the reading action the effect of the beam on the charged or uncharged area is detected.
此外，用此方法提取的电子散射参数被成功地用于相同实验条件下的电子束临近效应校正。
Furthermore, the parameters acquired by this method are successfully used for proximity effect correction in electron beam lithography on the same experimental conditions.
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