用化学气相沉积法(chemicalvapordeposit,CVD)在碳纤维增强碳化硅复合材料(carbonfiberreinforcedsiliconcarbidec...
基于4个网页-相关网页
用C3H6作为碳源气,Ar作为稀释气体和载气,TaCl5为钽源,采用化学气相沉积法(chemical vapor deposition,CVD)在高纯石墨表面制备TaC涂层。采用 .
基于3个网页-相关网页
用化学气相沉积法(chemicalvapordeposit,CVD)在碳纤维增强碳化硅复合材料(carbonfiberreinforcedsiliconcarbidec...
基于2个网页-相关网页
采用化学气相沉积法 Chemical Vapor Deposition
利用化学气相沉积法 chemical vapor deposition
采用热化学气相沉积法 thermal chemical vapor deposition ; TCVD
采用了化学气相沉积法 Chemical Vapor Deposition
首先采用溶胶-凝胶法制备镍催化剂，在此基础上用化学气相沉积法高产率地制备了碳纳米管。
The catalyst was first produced by sol-gel method and the carbon nanotubes were high yield synthesized by the catalytic chemical vapor decomposition method.
研究所用的碳纳米管是用热灯丝化学气相沉积法合成的。
The carbon nanotubes were synthesized by the heat filament chemical vapor deposition.
所用的碳纳米管是用热灯丝化学气相沉积法合成的。
Carbon nanotubes in experiments were synthesized by hot filament chemical vapor deposition.
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