依据新配置的光应力系统试验要求,需设计一套大视场、宽光谱、长焦距的微光准直物镜。
Based on the new configuration of optic stress system, we need to design a wide bands and long focal night vision collimating lens.
提出了针对大视场投影光刻物镜畸变的计算方法,并在完成的畸变特性测量装置上进行了8英寸的硅片测量。
The calculative method of the large field projection lithography lens is presented, and on the distortion measuring setup which is accomplished, distortion measurement of 8 inch wafer is completed.
将照相物镜移植应用于其它系统大孔径、大视场物镜设计中,生产出与照相物镜结构相似、像质优良的镜头。
By the technique of transplantation application, the author manufactured the practical objective lens with high image quality, which has the similar structure as that of photographic lens.
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