为了提高在激光直写设备中光刻系统的写入精度，对光探头调焦系统进行了研究。
To improve the precision of the laser direct writing device, researches have been done for the focusing servo system.
文中给出了用激光直写设备在曲面基底上进行光刻来制作曲面微透镜阵列的方法。
The lithography technique to fabricate the curved microlens array on the curved substrate by using laser direct writing system was also given.
在二元光学元件激光直写设备中，主轴速度调节效果的好坏是决定刻划效率与精度的关键因素之一。
In the BOE laser direct-writing device, the adjusting effect of spindle velocity is one of the key factors for determining the lithography effectiveness and accuracy.
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