介绍了溅射法镀膜的基本原理，阐述了溅射法镀二氧化钛薄膜用靶材及相应溅射镀膜工艺的研究现状。
The basic principle of sputtering was presented, and the targets and techniques used in the preparation of titania thin film from sputtering were reviewed and discussed.
此外，B的增加显著降低了磁控溅射镀膜工艺的着火电压和维持放电电压，为实现低电压磁控溅射提供了另外一种思路。
Further more, the increase of B reduced greatly the touching off and keeping discharge voltages during magnetron sputtering coating, which gives another approach to lower voltage magnetron sputtering.
本文从工厂应用的角度着重讨论磁控溅射镀膜机镀氮化钛装饰膜的工艺问题。
With the view of the application in factory, the process of tin decorative coating coated by magnetron sputtering coater is emphatically discussed in this paper.
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