试样表面则必须经过抛光，清洗和烘干处理。
The specimen surface should be polished, cleaned, and dried .
用混合酸、清洗剂和纯水在清洗槽或超声波清洗机内清洗硅片，使其表面洁净并烘干。
Wash the wafers with mixed acid, lotion and UPW (ultra pure water) by ultrasonic cleaning in wet sinks to get a clean and dry surface of wafers.
湿式清洗是另一种选择，干洗店加盟使用特殊的洗衣机和烘干机。
Wet cleaning is another option that USES special washers and dryers.
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