化学汽相沉积 chemical vapor deposition ; CVD ; Hot Wire Chemical Vapor Deposition ; Metal-organic chemical vapor Deposition
高压化学汽相沉积 high-pressure chemical vapor deposition ; pressure chemical vapor deposition
低压化学汽相沉积 low-pressure chemical vapor deposition
化学汽相沉积系统 chemical vapor deposition system
快速热化学汽相沉积 RTCVD
指化学汽相沉积 CVD
激光化学汽相沉积 LCVD
次常压化学汽相沉积 SACVD
热丝化学汽相沉积 Hot Wire Chemical Vapor Deposition
金属有机化学汽相沉积 MOCVD ; Metal-organic Chemical Vapor Deposition
研究了直流等离子体化学汽相沉积（CVD）法合成的金刚石膜内应力随甲烷浓度、沉积温度的变化关系。
The internal stress in diamond thin films deposited by DC plasma CVD was studied as a function of methane concentration and deposited temperature.
射频辉光放电硅烷等离子体化学汽相沉积是制备氢化非晶硅薄膜的主要工艺技术。
Plasma chemical vapor deposition in silane radio frequency glow discharge is a main fabrication technology of hydrogenated amorphous silicon (a-Si: h) films.
本发明涉及自支撑式电极上金属集电器的物理或化学汽相沉积，例如蒸发。
The invention relates to physical or chemical vapor deposition, such as evaporation, of metal current collector on electrode with self-supporting type.
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