摘要：投影曝光工艺是集成电路制造过程中的关键环节，曝光系统的工艺水平已成为衡量微电子制造技术的重要标志。

Abstract: Lithographic exposure is the key process in the manufacture of integrated circuit, and the performance of exposure system decides the level of microelectronic manufacture technology.

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投影曝光工艺是集成电路制造过程中的关键环节，曝光系统的工艺水平已成为衡量微电子制造技术的重要标志。

Lithographic exposure is the key process in the manufacture of integrated circuit, and the performance of exposure system decides the level of microelectronic manufacture technology.

youdao

开发具有自主知识产权的IP核不仅具有广泛的应用前景而且对提高我国集成电路设计和应用水平具有重要意义。

Developing IP that having independent intellectual property right have the prospect applying broadly not only and have importance to raising our country IC designing and application level.

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