这个模型在普通的化学放大胶光刻模拟的基础上，添加了溶胀模型和对显影速率随深度变化效应的模拟。
The models are based on usual simulation models for chemically amplified photoresist added with swell model and the model for depth - dependent dissolution rate effect.
结果表明，加料顺序、加料方式、成胶温度、老化时间、搅拌速率以及干燥焙烧等因素对孔结构均有明显影响。
The results showed that sequence and way of feeding, reaction temperature, time of aging, stirring speed and drying and calcinations had remarkable influence on the pore structure.
繁殖方式对干物质量的增长速率无明显影响。
Propagation methods showed no distinct actions on the increasing rate of the dry weight of rhizomes.
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