这一金属镀层过程对铬掩模塑料有非常广泛的作用。
The metalization process is used to chrome plate plastic for a variety of USES.
给出了该掩模设计制作工艺过程及深x射线光刻结果。
The fabrication procedure of the mask and results of the deep X ray lithography are given.
本文分析了它的物理机制、掩模类型、编码过程、约束条件和优化方法。
The paper analyses the gray-tone mask physical mechanism, coding and optimum process.
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