给出了该掩模设计制作工艺过程及深x射线光刻结果。
The fabrication procedure of the mask and results of the deep X ray lithography are given.
基于基尔霍夫标量衍射理论，采用光线追迹法设计了连续型平面衍射聚光透镜掩模。
According to Kirchhoff's scalar diffraction theory, with the ray tracing method, a continuous relief mask for diffractive focus lens has been designed.
实验结果表明该方法对复杂相移掩模的设计有效，可以减小邻近效应。
The experiment results show that the method is effective to devise complex phase? Shifting masks and the proximity effect is decreased.
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