台面掩模 [电子] mesa mask
Taking advantage of synchronization compensator, position compensation is fulfilled by using the fine reticle stage to compensate the deviation between position of the wafer stage and wafer stage.
设计了同步补偿器,利用掩模台微动台运动实时补偿掩模台与硅片台间的位置同步误差。
参考来源 - 极紫外光刻机工件台精密机械及控制相关技术·2,447,543篇论文数据,部分数据来源于NoteExpress
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