... projection display device 投影式显示掐 projection exposure 投影曝光 projection imaging 投影成像 ...
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无接触投影曝光 out of contact printing ; noncontact printing ; nonconacumen press ; out of contact press
紫外线投影曝光 uv projection printing
单位放大投影曝光装置 unity magnification projection unit
一比一投影曝光装置 one to one projection system
扫描式投影曝光 scanning projection printing
收缩式投影曝光装置 reduction aligner
步进式投影曝光装置 projection stepper
光学投影曝光法 [光] optical projection exposure method
扫描投影曝光 Scanning Project Printing
具有角度限制的电子束投影曝光技术有可能成为21世纪最有潜力的纳米光刻技术之一。
The projection electron beam lithography with angular limitation(PEBL)is potentially one of the most attractive techniques for nano lithography in the21st Century.
投影曝光工艺是集成电路制造过程中的关键环节，曝光系统的工艺水平已成为衡量微电子制造技术的重要标志。
Lithographic exposure is the key process in the manufacture of integrated circuit, and the performance of exposure system decides the level of microelectronic manufacture technology.
摘要：投影曝光工艺是集成电路制造过程中的关键环节，曝光系统的工艺水平已成为衡量微电子制造技术的重要标志。
Abstract: Lithographic exposure is the key process in the manufacture of integrated circuit, and the performance of exposure system decides the level of microelectronic manufacture technology.
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