介绍了利用光场控制中性原子束制作微细图形的基本原理。
The basic principle of fabricating nanometer patterns by controlling neutral atoms is introduced in this paper.
介绍了一种功能薄膜微细图形制备新方法—化学修饰溶胶-凝胶法。
A new way called chemically modified sol-gel method for preparing patterned functional films is introduced.
研究结果表明，此技术可实现分辨率高达几个纳米大小的超微细图形制作，制作效率极高。
The results show that the technology can realize super finest patterns of several nanometers and the fabricating efficiency is very high.
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