器件采用最小2微米设计规则，两层多晶硅结构。
This detector line array is fabricated using 2 micron design rule and a double level poly silicon structure.
深亚微米集成电路的互连线延迟是设计中需十分重视并必须解决的问题。
Interconnect wire delay is a very important question that must to be resolved in deep submicron IC design.
这种模块化后过滤器包括：？现代设计和外观？ 0.5微米元件？重量轻？高流量与最小压降。
This modular afterfilter includes:? Modern Design and Appearance? 0.5 Micron Element? Lightweight? High Flow Capacity with Minimal Pressure Drop.
应用推荐