指出等离子体辅助沉积工艺更有利于长波红外滤光片膜层的显微结构改善和残余应力的消除。
It is pointed out that the plasma assistant deposition technology is more favorable to the improvement of microstructure and the elimination of residual stress for long wavelength infrared filters.
绝缘层的突变（指电缆端部）引起非常大的集中的电应力（电场强度），这可通过电缆穿出地面时采用昂贵的称为“电缆头”的端部来消除。
Abrupt insulation changes cause very large concentrated electrical stresses. These stresses can be eliminated by terminating the cable above ground in an expensive device known as pothead "."
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