研究了直流等离子体化学汽相沉积（CVD）法合成的金刚石膜内应力随甲烷浓度、沉积温度的变化关系。
The internal stress in diamond thin films deposited by DC plasma CVD was studied as a function of methane concentration and deposited temperature.
结果表明，磁流变液的剪切应力随着磁性固体粒子浓度增大而增大，随磁性固体粒子的磁化强度呈平方正比关系。
The results show that the shear stress increases as the rising of the particle volume fraction, and the shear stress is proportional to the square of the magnetization.
分析了其应力的传递过程，建立了法布里-珀罗腔腔长变化与氢浓度关系的数学模型。
The stress transfer model of the sensor is analyzed and the relationship between the change of Fabry-Perot gap length and hydrogen concentration is constructed.
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