装备及工艺的改变，解决了原来毛纺设备不能解决的问题。
Changes in equipment and technology to solve the original wool equipment can not solve the problem.
固溶工艺的改变对阳极氧化膜的厚度均匀性无显著影响，氧化膜自身的成分结构决定了其膜层厚度的均匀性。
The change of heat treatment had no obvious effect on the uniformity of thickness, which was detected by the composition structure of the films.
器件栅氧厚度的减小、场氧工艺的改变以及衬底材料的不同等都将导致MOS器件的总剂量辐射效应发生改变。
The decrease of the gate oxide, the differences of field oxides processing and the selection of the substrate materials will all affect the total dose radiation effects of MOS devices.
应用推荐