给出了该掩模设计制作工艺过程及深x射线光刻结果。
The fabrication procedure of the mask and results of the deep X ray lithography are given.
着重介绍了LIGA工艺中X射线光刻掩模的制作步骤和方法。
The paper introduces emphatically the making step and method of X -ray lithograph etching in LIGA technology.
对利用X射线光刻制作大高宽比硬x射线波带片的设计和制作工艺进行了研究。
The design and fabrication of high aspect-ratio hard X-ray zone plates by X-ray lithography are studied.
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