最后给出了实际测量结果。
确定测量系统的误差源，并从理论上对实际测量结果的精度进行分析。
Determine the error source of the measurement system, and analyze the accuracy of the actual measurement result in theory.
本文根据实际测量结果，一叙述了半导体衬底制片质量对外延生长的影响。
Based on actual measurement results, the influence of process quality of semiconductor substrate wafers on epitaxial growth is described.
应用推荐