高z材料因其高熔点和低溅射率近年来受到越来越多的关注，但是难熔材料的脆性等问题仍然是这类材料应用的一大障碍。
More attentions are paid to high Z materials because of their high melting point and low sputter rate, but such materials remain the problems of brittleness to which is harmful for their application.
动态tcis可以研究离子束轰击三元靶的复杂问题：如大剂量离子注入、择优溅射和界面混合等。
Dynamic TCIS code may investigate complex problems concerning three-elemental targets bombarded by energetic ions, such as the ion implantation at large dose, preferential sputtering, ion mixing, etc.
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