该技术通过平移实物参考面，测得其上位相分布，利用其位移距离与位相增量之间的关系，以最小二乘方法计算位相差与物面深度之间的映射关系。
According to the shifted distance and the phase increment, the mapping relationship between phase difference and depth of object can be determined by a least squares method.
大量数值计算表明：主动极限位移随土层深度增加而增加，但到一定深度后其增量为零。
Large scale numeric calculation shows that the active limiting displacement is increasing with the depth of retained soil, and that the increment is zero when the soil depth reach some degree.
针对三维曝光图形的结构特点，结合重复增量扫描方式，分别从水平和深度两个方向进行邻近效应校正。
The internal proximity effect correction in the electron beam lithography based on the variation of the pattern shape was studied.
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