研究了直流等离子体化学汽相沉积（CVD）法合成的金刚石膜内应力随甲烷浓度、沉积温度的变化关系。
The internal stress in diamond thin films deposited by DC plasma CVD was studied as a function of methane concentration and deposited temperature.
根据弗吉尼亚州费尔法克斯的一个废物处理咨询机构Gershman, Brickner &Bratton的数据，超过36家其他美国企业正在计划建设等离子体炬合成气工厂。
More than three dozen other American firms are proposing plasma-torch syngas plants, according to Gershman, Brickner &Bratton, a waste consultancy based in Fairfax, Virginia.
介绍了低温等离子体的基本概念及其在化学合成中的应用。
Basic conception of low temperature plasma and its application in the chemical synthesis are described.
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