... Optical Mark Recognition: (OMR)光学标记阅读机 optical mask: 光掩模,光屏蔽 optical matched filter: 光匹配滤光器 ...
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Photomask industry needs not only excellent technology, up to date equipments and management skills, but also funds as investment.
光掩模制造是集成电路产业链中工艺、设备、管理技术要求最高,资金投入比重最大的瓶颈工序。
参考来源 - 上海凸版光掩模有限公司竞争战略研究·2,447,543篇论文数据，部分数据来源于NoteExpress
在整套工艺环节中，光掩模版图设计和湿法腐蚀是两个关键步骤。
The mask design and the wet etching are both key processes in the technology introduced.
本发明相比于公知的像素结构制作方法，可以简化工艺步骤并减少光掩模的制作成本。
Compared with the well known manufacturing method of a pixel structure, the invention can simplify processing steps and reduces the manufacturing cost of photomask.
对薄层电阻、接触、光掩模对准、线条宽度、器件参数与掺杂的相关性等内容进行了初步试验和分析。
The initial experiments on and analysis of sheet resistance, contact, photomask alignment, line width, and correlations between device parameters and dopants have been made.
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