表面要求具有纳米粗糙度和亚微米精度的高质量易损晶体的生产是一种生产重要光学仪器的技术。
The production of high quality surfaces with nanometric roughness and sub-micrometer accuracy on brittle crystals is an emerging technology having important optical applications.
针对超精密光滑光学元件加工过程中容易出现的粗糙度较大和表面疵病较多的现象，对传统抛光机理和抛光过程中抛光粉的主要参量对抛光质量的影响进行了研究。
In view of the phenomena that the easy appearance of serious roughness and surface defects, the polishing mechanism and the influence of the main parameters on the polishing quality are researched.
提出以光散射理论为基础，利用光学技术实现表面粗糙度的在线测量。
An in-process measuring of using optical technology based on light scattering theory is presented.
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