电子束光刻系统 E-Beam Lithography
光激励蚀刻系统 photo excited etching system
激光划刻系统 laser row moment system
成铭激光精密雕刻系统 CM laser carving system
为了提高在激光直写设备中光刻系统的写入精度，对光探头调焦系统进行了研究。
To improve the precision of the laser direct writing device, researches have been done for the focusing servo system.
本文介绍制造回光栅所采用的一种新型接近式光刻系统的原理、结构和光刻性能。
In this paper, the principle, construction and function of a new near photolithography system for manufacturing circular gratings are introduced.
根据测量的树脂的特性值，使用实验室开发的微反射镜动态掩膜微立体光刻系统，成功制作微齿轮。
According to the two values, a micro-gear was fabricated by projection microstereolithography system using digital micro mirror dynamic mask.
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