... lithographic equipment 光刻装置 lithographic imagery 光刻成象 lithographic mask 光刻掩模 ...
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着重介绍了LIGA工艺中X射线光刻掩模的制作步骤和方法。
The paper introduces emphatically the making step and method of X -ray lithograph etching in LIGA technology.
本发明提供了一种EUV光刻掩模、其制造方法与其使用方法。
An EUV Lithography mask, a fabrication method, and use method thereof is provided.
激光直写系统的应用，可以分成一次曝光制作光刻掩模和多次套刻曝光制作器件两个方面。
Mask making with one step exposure and device making with multiple overlay exposure are applications of the system.
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