对二氧化硅反应离子刻蚀中反应室压力，刻蚀气体流量和射频功率等因素对刻蚀速率和刻蚀均匀性的影响进行了研究。
The influence of chamber pressure, gas flow rate and RF power on micro loading effect in reactive ion etch of silicon dioxide is researched.
通常，硅碳化合物通常由加热的沙子(通常由石英构成，或称二氧化硅)和石油或煤炭中提取的碳放在电气炉内反应而得到。
Normally, silicon carbide is produced by heating sand (which is made of quartz, or silicon dioxide) in an electric furnace with carbon made from oil or coal.
以二氧化硅为起始原料，与乙二醇、氢氧化钾反应，生成高活性的五配位硅钾化合物。
High reactive penta-coordinated organic silicon was prepared via the reaction of silica with ethylene glycol and potassium hydroxide.
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