介绍了一种通过微细加工技术即二次X射线曝光制作凹面光栅的方法。
The technique of fabricating concave gratings in PMMA by double X-ray exposures is described.
将要讨论的技术包括：波长和能量色散谱，扫描背散射电子，二次电子，阴极射线磷光和X射线成像。
Techniques to be discussed are wavelength and energy dispersive spectrometry, scanning backscattered electron, secondary electron, cathodoluminescence, and X-ray imaging.
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