这些不同的辉光放电的鞘是低得多。
These differ from glow discharges in that the sheaths are much less intense.
最简单的放电产生方法是辉光放电。
本文介绍用直流辉光放电装置制备非晶硅薄膜。
Amorphous silicon films were fabricated with a dc glow discharge system.
与辉光放电相比，阴极位降相对较低的放电形式。
Electric discharge characterized by a cathode fall that is small compared with that in a glow discharge.
研究了接触辉光放电等离子体降解水体中的酸性品红。
The degradation of Fuchsin acid in aqueous solution by contact glow discharge electrolysis is investigated.
阴极的温度是影响大电流辉光放电稳定工作的重要因素。
Cathode temperature is one of the most important factors influencing the stability of high current glow discharge.
本文叙述了辉光放电等离子体源的等离子体源离子注入。
In this paper, a glow discharge plasma source ion implantation technique is described.
研制成一种以玻璃作为个电材料的管式辉光放电臭氧发生器。
An ozone generator with glow discharge tube has been developed by using glass as dielectric material.
热阴极辉光放电的阳极区与阴极区一样，是一个很薄的区域。
The anode fall region is also a very narrow gap like the cathode fall region.
热阴极辉光放电的阳极区与阴极区一样，是一个很薄的区域。
The anode is also positioned such that there is no gap between the anode and the non-light-emitting area.
介绍了辉光放电光谱技术的原理及与其它表面分析技术的比较。
The principle of glow discharge optical emission spectrometry was introduced in this paper, and was compared with other surface analysis techniques.
它由真空主抽气系统、抽气偏滤器、直流辉光放电清洗系统组成。
It consists of the main pumping system, pumping divertor and glow discharge cleaning (GDC) system.
本文简要叙述了HL-1M的DC辉光放电清洗技术和放电结果。
The paper gives a brief description of the DC glow discharge cleaning in the HL 1M tokamak.
在采用双辉光放电实施的离子渗金属加工中，存在强烈的边角效应。
There are strong edge effects in the production of element diffusion into metal by double glow discharge.
从理论上研究了辉光放电时的离化率、正离子浓度、工件的加热问题。
This paper deals with the problems of ionization proportion, ion density and heating work piece on glow discharge.
相对于常规冷阴极辉光放电而言，热阴极辉光放电是一种新型放电形式。
Comparing with the conventional cold glow discharge, the hot cathode glow discharge is a new type of gas discharge.
利用同轴介质阻挡辉光放电装置在大气压流动氩中产生了均匀的等离子体射流。
A uniform plasma plume is generated by using dielectric barrier discharge in a coaxial geommetry in flowing argon at one atmospheric pressure.
射频辉光放电硅烷等离子体化学汽相沉积是制备氢化非晶硅薄膜的主要工艺技术。
Plasma chemical vapor deposition in silane radio frequency glow discharge is a main fabrication technology of hydrogenated amorphous silicon (a-Si: h) films.
它产生的高气压高电流密度辉光放电等离子体能够用来制作平面等离子体显示或光源。
With the micro-discharge array, the glow discharge plasmas with high-pressure and high-current density can be formed to make DC plasma display panel.
在交流电场中，利用介质阻挡层和高频激励源，可获得稳定均匀的大气压下辉光放电。
In AC electrical field, the stable homogeneous glow discharge will appear by using dielectric barrier layer and high-frequency power source.
用椭圆偏振光谱法研究了热处理对射频辉光放电淀积的氢化非晶碳膜光学性质的影响。
Using spectroscopic ellipsometry, the influence of thermal annealing on optical properties of the plasma-deposited hydrogenated amorphous carbon films is investigated.
探讨了与气体流动等条件相结合，用预电离方法实现大气压下空气中辉光放电的可能性。
By using of the preionization combined with the gas flow or other methods, the probability of obtaining atmosphere glow discharges in air is discussed, too.
对大气压反常辉光放电条件下CH4 -CO2重整制合成气反应过程进行了数值模拟。
The numerical simulation of CO2 reforming with CH4 to synthesis gas was carried out under the condition of atmospheric abnormal glow discharge.
本论文通过对反应器结构的改进，成功地研制出了大气压反常辉光放电等离子体化学反应器。
In this dissertation, through some improvements of conventional reactor structure, a new abnormal glow discharge plasma chemical reaction apparatus under atmospheric pressure has been invented.
文本研究了用电容耦合RF辉光放电和高压电晕放电产生的等离子体对聚丙烯材料表面改性。
The polypropylene surface modification is researched using plasma generated by capacitance-coupled RF glow discharge and by high voltage corona discharge.
大电流热阴极辉光放电用于等离子体化学气相沉积金刚石膜，有效地提高了沉积速率和膜品质。
Large current hot cathode glow discharge was used for plasma chemical vapor deposition of diamond films. It improved deposition rate and films quality efficiently.
采用蒙特卡罗方法对氮气辉光放电等离子体阴极区离子(N +2)的运输过程进行了模拟。
The ion (n + 2) transport process in cathode dark space of nitrogen glow discharge plasma is studied by using Monte Carlo Simulatoon.
直流热阴极辉光放电等离子体化学气相沉积法是我们建立的快速沉积高品质金刚石膜的新方法。
Direct current hot cathode plasma glow discharge chemical vapor deposition (DC-HCPCVD) is a new method to deposit high quality diamond films with high growth rate.
直流热阴极辉光放电等离子体化学气相沉积法是我们建立的快速沉积高品质金刚石膜的新方法。
Direct current hot cathode plasma glow discharge chemical vapor deposition (DC-HCPCVD) is a new method to deposit high quality diamond films with high growth rate.
应用推荐